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Aurora Integrated RF Power Supply 整合式高頻電源供應器
Application Range In Plasma Systems
PVD 物理氣相沉積
HDP-CVD 高密度化學氣相沉積
Capacitively coupled plasma (CCP) 電容耦合電漿and Inductively Coupled Plasma ( ICP) 感應耦合電漿系統
Reactive Ion Etching (RIE) 電漿蝕刻
PECVD (Plasma Enhanced Chemical Vapor Deposition) 電漿輔助化學沉積
Plasma Clean System 電漿清潔系統
Atmospheric Plasma System 常壓大氣電漿系統
 Biomedical-Biochip 生物醫學-生物晶片
 Nano-materials 奈米材料

Aurora IPS 300 Integrated RF Power Supply

  • Model Number: Aurora IPS 300
    System Specification
    Input: AC90V-240V,50-60HZ,6A
    RF Output Power: MAX 200W (Optional 300W)
    Conforms to FCC and CE.
    Frequency:13.56MHZ +/- 50PPM
    Power Range Adjustment: continuous 1 W to 200 W
    Output Impedance: 50ohm
    Real Time Automatching (up to 1,000 W)(1.5 KW Optional)
     DC Pulse Trigger
    Air Cooling
    Dimension (WXDXH): 482 X 560 X 170mm
    Weight: about 55 lbs.
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